Flow visualisation of a cavitating hydrofoil as part of a preliminary test validation study for a large numerical and physical research project.


CFD-TOPO is a feature scale evolution solver used to predict the transport, chemistry, etch and deposition of semiconductor materials on the microscopic scale. It enables prediction of three-dimensional topological evolution for multiple materials during thermal or plasma enhanced fabrication of electronic devices.

Inductively Coupled Plasma Reactor

Designed primarily for the Semiconductor industry, CFD-TOPO is a flexible, modular software package which can be operated as a stand-alone code, or coupled with CFD-ACE+ reactor scale models for an integrated multi-scale solution. Advanced capabilities of CFD-TOPO include:

  • Three-dimensional
  • Multiple materials and complex chemistries
  • Fast adaptive meshing
  • Fully integrated with CFD-ACE+
  • Fully commercialized and supported
  • Can be customized for a specific reactor or processes, for ease-of-use and accuracy

ACE+ Suite modules

ACE+ Suite comprises of the modules which can be used solely, coupled or in conjunction with complimenting software.